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OTFC Series
(For Edge Filters, Band Pass Filters, AR Coatings, etc.)
OTFC series, based on the ion-assisted technology, are the most
suitable coating system for producing AR coatings
and optical filters such as edge filters, band pass filters etc.
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¡á Chamber size:¥õ600mm - ¥õ1800mm
¡á 60-point optical thickness monitor.
¡á RF ion source achieving uniformed, larger ion beam distribution over a larger area at high ion current density.
¡á Over 100 layers can be deposited by 2 EB guns and multi-point crucible hearth or annular hearth.
¡á Auto-deposition control system for fully automated process.
¡á Center-driving or planetary substrate dome is selectable.
¡á Diffusion pumps plus Polycold or Cryo- pumps.
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OTFC-1100 |
| Model |
OTFC-1100CBI/DBI
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| Vacuum Chamber |
SUS304,¥õ1100mm¡¿1520mm(H) |
| Substrate Dome Size |
¥õ950mm |
| Substrate Dome Rotation Speed |
10rpm to 50rpm(Variable) |
Optical Film Thickness
Control System |
HOM2-R-VIS350AHigh-precision Optical Monitor
Wavelength range::350nm to 1100nm
Reflection/Transmittance |
| Crystal Film Thickness Monitor |
XTC/3+6point rotary sensor |
| Evaporation Source |
EB source: 2 units |
| Ion Source |
17cm RF Ion Source |
| Vacuum System |
Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps + Super Trap |
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| Performance |
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| Ultimate Pressure |
7.0 ¡¿ 10-5Pa or lower |
| Pump Down Rate |
30 minutes (Atm. to 1.3 ¡¿ 10-3Pa) |
| Substrate Heater |
350¡É (max.) |
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| Utility |
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| Layout Dimensions |
å³5000mm(W)¡¿6000mm(D)¡¿3300mm(H) |
| Power Requirements |
3-phase, 200V, 50/60Hz, 100kVA approx. |
| Cooling Water Flow Rate |
120 /min or greater |
| Compressed Air Pressure |
0.5MPa or greater |
| Gross Weight |
8500kg approx. |
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OTFC-1300 |
| Model |
OTFC-1300CBI/DBI
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| Vacuum Chamber |
SUS304,¥õ1300mm¡¿1610mm(H) |
| Substrate Dome Size |
¥õ1130mm |
| Substrate Dome Rotation Speed |
10rpm to 50rpm(Variable) |
Optical Film Thickness
Control System |
HOM2-R-VIS350A High-precision Optical Monitor
Wavelength range: 350nm to 1100nm
Reflection/Transmittance |
| Crystal Film Thickness Monitor |
XTC/3 plus 6-point rotary sensor |
| Evaporation Source |
EB source: 2 units |
| Ion Source |
17 cm RF ion source |
| Vacuum System |
Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps + Super Trap |
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| Performance |
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| Ultimate Pressure |
7.0 ¡¿ 10-5Pa or lower |
| Pump Down Rate |
30 minutes (Atm. to 1.3 ¡¿ 10-3Pa) |
| Substrate Heater |
350¡É (max.) |
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| Utility |
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| Layout Dimensions |
5000mm (W) ¡¿ 6500mm (D) ¡¿ 3500mm (H) approx. |
| Power Requirements |
3-phase, 200V, 50/60Hz, 104kVA approx. |
| Cooling Water Flow Rate |
140 /min. or greater |
| Compressed Air Pressure |
0.5MPa or higher |
| Gross Weight |
9000kg approx. |
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OTFC-1550 |
| Model |
OTFC-1550CBI/DBI
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| Vacuum Chamber |
SUS304,¥õ1550mm¡¿1800mm(H) |
| Substrate Dome Size |
¥õ1400mm |
| Substrate Dome Rotation Speed |
10rpm to 30rpm(Variable) |
Optical Film Thickness
Control System |
HOM2-R-VIS350A High-precision Optical Monitor
Wavelength range: 350nm to 1100nm
Reflection/Transmittance |
| Crystal Film Thickness Monitor |
XTC/3 plus 6-point rotary sensor |
| Evaporation Source |
EB source: 2 units |
| Ion Source |
17 cm RF ion source |
| Vacuum System |
Roughing Pump, 2 Diffusion Pumps + PolycoldOr 2 Cryo Pumps + Super Trap |
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| Performance |
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| Ultimate Pressure |
7.0 ¡¿ 10-5Pa or lower |
| Pump Down Rate |
20 minutes (Atm. to 1.3 ¡¿ 10-3Pa) |
| Substrate Heater |
350¡É (max.) |
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| Utility |
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| Layout Dimensions |
5500mm (W) ¡¿ 7200mm (D) ¡¿ 3700mm (H) approx. |
| Power Requirements |
3-phase, 200V, 50/60Hz, 120kVA approx. |
| Cooling Water Flow Rate |
150 /min or greater |
| Compressed Air Pressure |
0.5MPa or greater |
| Gross Weight |
11000kg approx. |
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OTFC-1300 |
| Model |
OTFC-1800CBI/DBI
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| Vacuum Chamber |
SUS304,¥õ1800mm¡¿1920mm(H) |
| Substrate Dome Size |
¥õ1600mm |
| Substrate Dome Rotation Speed |
10 rpm to 30 rpm (Variable) |
Optical Film Thickness
Control System |
HOM2-R-VIS350A High-precision Optical Monitor
Wavelength range: 350nm to 1100nm
Reflection/Transmittance |
| Crystal Film Thickness Monitor |
XTC/3 plus 6-point rotary sensor |
| Evaporation Source |
EB source: 2 units |
| Ion Source |
23 cm RF ion source |
| Vacuum System |
Roughing Pump, 2 Diffusion Pumps + PolycoldOr 2 Cryo Pumps + Super Trap |
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| Performance |
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| Ultimate Pressure |
7.0 ¡¿ 10-5Pa or lower |
| Pump Down Rate |
20 min (Atm. to 1.3 ¡¿ 10-3Pa) |
| Substrate Heater |
350¡É (max.) |
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| Utility |
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| Layout Dimensions |
5700mm (W) ¡¿ 7700mm (D) ¡¿ 4000mm (H) approx. |
| Power Requirements |
3-phase, 200V, 50/60Hz, 150kVA approx. |
| Cooling Water Flow Rate |
180 /min or greater |
| Compressed Air Pressure |
0.5MPa or greater |
| Gross Weight |
13000kg approx. |
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Optical Thin Film Coater
for coating on plastic substrates
OTFC-L
This optical thin film coater is newly designed for coating at
plastic substrate.
Our unique technology allows making coatings
on various plastic substrates such as PMMA, Polycarbonate,
Zeonex, etc.
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¡á Optimum design for coating on plastic substrates
¡á Highquality optical films produced on plastics by special coating
processes.
¡á Passed strict environmental tests.
¡á Automatic coating processes achieved by ACS program.
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OTFC-M
This optical thin film coater is designed for producing high
performance metal mirror.
Both metallic mirrors and quality optical
films can be made at high rate. Metal mirrors are resistant with
high reflection by applying our unique technology.
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¡á Optimum design for metal mirrors.
¡á High reflection index achieved by the exhaust system.
¡á Passed strict environmental tests.
¡á Automatic coating processes achieved by ACS program.
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OTFC-PX
OTFC-PX, equipped with a planetary dome and ion source is suitable for coating a reflector and lenses with high curvature.
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¡á Planetary dome improves coating uniformity over substrate.
¡á Dome angle can be inclined in accordance with lens curvature.
¡á IAD system greatly improves film quality.
¡á High precision spectrum property at spherical substrate can be obtained at high accuracy by optical monitor.
¡á Large size chamber (1800 mm in diameter) with planetary dome
increases productivity.
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OTFC-IR1
This device is designed for infrared filter coating, and the wavelength range of the optical film thickness monitor
is extended to 1700¢¦5500nm against the previous version of 900¢¦2400nm.
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¡á Optical film thickness monitor: wavelength range 1700¢¦5500nm, wavelength resolution 3¢¦50nm. (changeable)
¡á Optical film thickness monitor: light stability ±0.05% or less at infrared range.
¡á The coater is optimized for depositing infrared filters with high performance, high quality and high reproducibility.
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